Please use this identifier to cite or link to this item: https://ptsldigital.ukm.my/jspui/handle/123456789/426801
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dc.contributor.authorBarmawi M.-
dc.contributor.authorKhairurrijal-
dc.date.accessioned2023-08-04T04:44:15Z-
dc.date.available2023-08-04T04:44:15Z-
dc.identifier.otherukmvital:57848-
dc.identifier.urihttps://ptsldigital.ukm.my/jspui/handle/123456789/426801-
dc.language.isoen-
dc.publisherInstitute of Advanced Studies, University of Malaya and Malaysian Institute of Chemistry-
dc.subjectChemical vapour deposition-
dc.subjectMicrowave plasma-
dc.subjectSilicon-
dc.subjectThin carbon films-
dc.subjectThin carbon films-
dc.subjectSilicon-
dc.titleMicrowave plasma chemical vapour deposition : a model for the production of thin carbon films, with possible extension to silicon-
dc.typeSeminar Papers-
dc.identifier.callnoQD181.S6A84 1989 sem n.1-
dc.contributor.conferencenameAsian Network for Analytical and Inorganic Chemistry International Chemical Conference on Silicon and Tin-
dc.coverage.conferencelocationKuala Lumpur-
dc.date.conferencedate1989-
Appears in Collections:Seminar Papers/ Proceedings / Kertas Kerja Seminar/ Prosiding

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