Please use this identifier to cite or link to this item: https://ptsldigital.ukm.my/jspui/handle/123456789/584691
Title: Characterization Of Alignment Strategy To Achieve A Reliable Alignment Accuracy In Advanced Lithography
Authors: Mohd Jeffery Manaf
Normah Ahmad
Uda Hashim
Keywords: alignment mark
alignment performance
lithography
overlay
tanda penjajaran
Issue Date: 2007
News Source: Jurnal Kejuruteraan
ISSN: 0128-0198
Call Number: Siri TA1.J81
Publisher: Penerbit UKM
Appears in Collections:UKM Journal Article / Artikel Jurnal UKM

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